
By Roel Gronheid,Paul Nealey
The directed self-assembly (DSA) approach to patterning for microelectronics makes use of polymer phase-separation to generate positive factors of lower than 20nm, with the positions of self-assembling fabrics externally guided into the specified development. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the layout, construction, purposes and destiny advancements had to facilitate the widescale adoption of this promising technology.
Beginning with a fantastic evaluate of the physics and chemistry of block copolymer (BCP) fabrics, half 1 covers the synthesis of latest fabrics and new processing tools for DSA. Part 2 then is going directly to define the main modelling and characterization rules of DSA, reviewing templates and patterning utilizing topographical and chemically changed surfaces, line side roughness and dimensional regulate, x-ray scattering for characterization, and nanoscale pushed meeting. ultimately, half three discusses program components and similar concerns for DSA in nano-manufacturing, together with for simple good judgment circuit layout, the inverse DSA challenge, layout decomposition and the modelling and research of enormous scale, template self-assembly production techniques.
- Authoritative outlining of theoretical rules and modeling strategies to provide an intensive introdution to the topic
- Discusses a large diversity of practical applications for directed self-assembly in nano-manufacturing
- Highlights the significance of this know-how to either the present and way forward for nano-manufacturing by exploring its capability use in a variety of fields
Read Online or Download Directed Self-assembly of Block Co-polymers for Nano-manufacturing (Woodhead Publishing Series in Electronic and Optical Materials) PDF
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Directed Self-assembly of Block Co-polymers for Nano-manufacturing (Woodhead Publishing Series in Electronic and Optical Materials) by Roel Gronheid,Paul Nealey
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